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Focused Ion Beam Systems
Basics and Applications
Taschenbuch von Nan Yao
Sprache: Englisch

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Beschreibung
This edited volume, first published in 2007, comprehensively covers the focused ion beam and two beam technology.
This edited volume, first published in 2007, comprehensively covers the focused ion beam and two beam technology.
Inhaltsverzeichnis
List of contributors; Preface; 1. Introduction to the focused ion beam system Nan Yao; 2. Interaction of ions with matter Nobutsugu Imanishi; 3. Gas assisted ion beam etching and deposition Hyoung Ho (Chris) Kang, Clive Chandler and Matthew Weschler; 4. Imagining using electrons and ion beams Kaoru Ohya and Tohru Ishitani; 5. Characterization methods using FIB/SEM DualBeam instrumentation Steve Rentjens and Lucille A. Giannuzzi; 6. High-density FIB-SEM 3D nanotomography: with applications of real-time imaging during FIB milling E. L. Principe; 7. Fabrication of nanoscale structures using ion beams Ampere A. Tseng; 8. Preparation for physico-chemical analysis Richard Langford; 9. In-situ sample manipulation and imaging T. Kamino, T. Yaguchi, T. Ohnishi and T. Ishitani; 10. Micro-machining and mask repair Mark Utlaut; 11. Three-dimensional visualization of nanostructured materials using focused ion beam tomography Derren Dunn, Alan J. Kubis and Robert Hull; 12. Ion beam implantation of surface layers Daniel Recht and Nan Yao; 13. Applications for biological materials Kirk Hou and Nan Yao; 14. Focused ion beam systems as a multifunctional tool for nanotechnology Toshiaki Fujii, Tatsuya Asahata and Takashi Kaito; Index.
Details
Erscheinungsjahr: 2010
Fachbereich: Allgemeines
Genre: Technik
Rubrik: Naturwissenschaften & Technik
Medium: Taschenbuch
ISBN-13: 9780521158596
ISBN-10: 0521158591
Sprache: Englisch
Ausstattung / Beilage: Paperback
Einband: Kartoniert / Broschiert
Redaktion: Yao, Nan
Hersteller: Cambridge University Press
Maße: 244 x 170 x 23 mm
Von/Mit: Nan Yao
Erscheinungsdatum: 26.08.2010
Gewicht: 0,701 kg
Artikel-ID: 107239673
Inhaltsverzeichnis
List of contributors; Preface; 1. Introduction to the focused ion beam system Nan Yao; 2. Interaction of ions with matter Nobutsugu Imanishi; 3. Gas assisted ion beam etching and deposition Hyoung Ho (Chris) Kang, Clive Chandler and Matthew Weschler; 4. Imagining using electrons and ion beams Kaoru Ohya and Tohru Ishitani; 5. Characterization methods using FIB/SEM DualBeam instrumentation Steve Rentjens and Lucille A. Giannuzzi; 6. High-density FIB-SEM 3D nanotomography: with applications of real-time imaging during FIB milling E. L. Principe; 7. Fabrication of nanoscale structures using ion beams Ampere A. Tseng; 8. Preparation for physico-chemical analysis Richard Langford; 9. In-situ sample manipulation and imaging T. Kamino, T. Yaguchi, T. Ohnishi and T. Ishitani; 10. Micro-machining and mask repair Mark Utlaut; 11. Three-dimensional visualization of nanostructured materials using focused ion beam tomography Derren Dunn, Alan J. Kubis and Robert Hull; 12. Ion beam implantation of surface layers Daniel Recht and Nan Yao; 13. Applications for biological materials Kirk Hou and Nan Yao; 14. Focused ion beam systems as a multifunctional tool for nanotechnology Toshiaki Fujii, Tatsuya Asahata and Takashi Kaito; Index.
Details
Erscheinungsjahr: 2010
Fachbereich: Allgemeines
Genre: Technik
Rubrik: Naturwissenschaften & Technik
Medium: Taschenbuch
ISBN-13: 9780521158596
ISBN-10: 0521158591
Sprache: Englisch
Ausstattung / Beilage: Paperback
Einband: Kartoniert / Broschiert
Redaktion: Yao, Nan
Hersteller: Cambridge University Press
Maße: 244 x 170 x 23 mm
Von/Mit: Nan Yao
Erscheinungsdatum: 26.08.2010
Gewicht: 0,701 kg
Artikel-ID: 107239673
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