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Cover: 9783039438457 | Micro- and Nano-Fabrication by Metal Assisted Chemical Etching | Buch
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Micro- and Nano-Fabrication by Metal Assisted Chemical Etching
Sprache: Englisch

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Beschreibung
Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates-Si, Ge, poly-Si, GaAs, and SiC-and using different catalysts-Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes have been demonstrated with a high anisotropy and feature size in the nanoscale-nanoporous films, nanowires, 3D objects, and trenches, which are useful components of photonic devices, microfluidic devices, bio-medical devices, batteries, Vias, MEMS, X-ray optics, etc. With no limitations of large-areas and low-cost processing, MacEtch can open up new opportunities for several applications where high precision nano- and microfabrication is required. This can make semiconductor manufacturing more accessible to researchers in various fields, and accelerate innovation in electronics, bio-medical engineering, energy, and photonics. Accordingly, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on novel methodological developments in MacEtch, and its use for various applications.
Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates-Si, Ge, poly-Si, GaAs, and SiC-and using different catalysts-Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes have been demonstrated with a high anisotropy and feature size in the nanoscale-nanoporous films, nanowires, 3D objects, and trenches, which are useful components of photonic devices, microfluidic devices, bio-medical devices, batteries, Vias, MEMS, X-ray optics, etc. With no limitations of large-areas and low-cost processing, MacEtch can open up new opportunities for several applications where high precision nano- and microfabrication is required. This can make semiconductor manufacturing more accessible to researchers in various fields, and accelerate innovation in electronics, bio-medical engineering, energy, and photonics. Accordingly, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on novel methodological developments in MacEtch, and its use for various applications.
Details
Erscheinungsjahr: 2021
Fachbereich: Technik allgemein
Genre: Technik
Rubrik: Naturwissenschaften & Technik
Medium: Buch
ISBN-13: 9783039438457
ISBN-10: 303943845X
Sprache: Englisch
Ausstattung / Beilage: HC gerader Rücken kaschiert
Einband: Gebunden
Hersteller: MDPI AG
Maße: 250 x 175 x 12 mm
Erscheinungsdatum: 13.01.2021
Gewicht: 0,465 kg
Artikel-ID: 119576874
Details
Erscheinungsjahr: 2021
Fachbereich: Technik allgemein
Genre: Technik
Rubrik: Naturwissenschaften & Technik
Medium: Buch
ISBN-13: 9783039438457
ISBN-10: 303943845X
Sprache: Englisch
Ausstattung / Beilage: HC gerader Rücken kaschiert
Einband: Gebunden
Hersteller: MDPI AG
Maße: 250 x 175 x 12 mm
Erscheinungsdatum: 13.01.2021
Gewicht: 0,465 kg
Artikel-ID: 119576874
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