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Sputtering by Particle Bombardment III
Characteristics of Sputtered Particles, Technical Applications
Taschenbuch von Klaus Wittmaack (u. a.)
Sprache: Englisch

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Beschreibung
Sputtering, the ejection of atoms or groups of atoms from the surface of a solid bombarded by energetic particles, is a widely observed phenomenon that has many applications in today's experimental physics and technology. This is the third and final volume of a comprehensive review on sputtering. Whereas the first two volumes deal primarily with physical aspects such as the theory of sputtering, experimentally observed sputtering yields and surface topography changes, this volume is devoted to the characteristic properties of the sputtered particles and technological applications of sputtering. The particles are characterized by their energy, mass, and angular distributions, along with their charge and excitation states, while the applications described in- clude surface and depth analysis, micromachining, and the production of surface coatings and thin films. As in the previous two volumes, the various chapters have been written by the main authorities in the field. The book addresses a broad audience: scientists active in the field will find the overview and background information they have long been seeking, while students and new comers to surface science and materials science will find a readable introduction to sputtering.
Sputtering, the ejection of atoms or groups of atoms from the surface of a solid bombarded by energetic particles, is a widely observed phenomenon that has many applications in today's experimental physics and technology. This is the third and final volume of a comprehensive review on sputtering. Whereas the first two volumes deal primarily with physical aspects such as the theory of sputtering, experimentally observed sputtering yields and surface topography changes, this volume is devoted to the characteristic properties of the sputtered particles and technological applications of sputtering. The particles are characterized by their energy, mass, and angular distributions, along with their charge and excitation states, while the applications described in- clude surface and depth analysis, micromachining, and the production of surface coatings and thin films. As in the previous two volumes, the various chapters have been written by the main authorities in the field. The book addresses a broad audience: scientists active in the field will find the overview and background information they have long been seeking, while students and new comers to surface science and materials science will find a readable introduction to sputtering.
Zusammenfassung
Sputtering, the ejection of atoms from the surface of a solid bombarded by energetic particles, is a widely observed phenomenon that has many applications in today's experimental physics and technology. This final volume in a three-part review of sputtering deals with the characterization of the sputtered particles and applications of the technique. It will be of interest to researchers in universities and in industry.
Inhaltsverzeichnis
Angular, energy, and mass distribution of sputtered particles.- Charged and excited states of sputtered atoms.- Surface and depth analysis based on sputtering.- Desorption of organic molecules from solid and liquid surfaces induced by particle impact.- Production of microstructures by ion beam sputtering.- Production of thin films by controlled deposition of sputtered material.
Details
Erscheinungsjahr: 2014
Fachbereich: Atomphysik & Kernphysik
Genre: Mathematik, Medizin, Naturwissenschaften, Physik, Technik
Rubrik: Naturwissenschaften & Technik
Medium: Taschenbuch
Reihe: Topics in Applied Physics
Inhalt: xv
415 S.
66 s/w Illustr.
415 p. 66 illus.
ISBN-13: 9783662311042
ISBN-10: 3662311046
Sprache: Englisch
Ausstattung / Beilage: Paperback
Einband: Kartoniert / Broschiert
Autor: Behrisch, Rainer
Wittmaack, Klaus
Behrisch, R.
Hauffe, W.
Hofer, W. O.
Laegreid, N.
McClanahan, E. D.
Sundqvist, B. U. R.
Wittmaack, K.
Yu, M. L.
Redaktion: Wittmaack, Klaus
Behrisch, Rainer
Herausgeber: Rainer Behrisch/Klaus Wittmaack
Auflage: Softcover reprint of the original 1st ed. 1991
Hersteller: Springer-Verlag GmbH
Springer Berlin Heidelberg
Topics in Applied Physics
Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, D-69121 Heidelberg, juergen.hartmann@springer.com
Maße: 235 x 155 x 24 mm
Von/Mit: Klaus Wittmaack (u. a.)
Erscheinungsdatum: 23.08.2014
Gewicht: 0,657 kg
Artikel-ID: 105087973
Zusammenfassung
Sputtering, the ejection of atoms from the surface of a solid bombarded by energetic particles, is a widely observed phenomenon that has many applications in today's experimental physics and technology. This final volume in a three-part review of sputtering deals with the characterization of the sputtered particles and applications of the technique. It will be of interest to researchers in universities and in industry.
Inhaltsverzeichnis
Angular, energy, and mass distribution of sputtered particles.- Charged and excited states of sputtered atoms.- Surface and depth analysis based on sputtering.- Desorption of organic molecules from solid and liquid surfaces induced by particle impact.- Production of microstructures by ion beam sputtering.- Production of thin films by controlled deposition of sputtered material.
Details
Erscheinungsjahr: 2014
Fachbereich: Atomphysik & Kernphysik
Genre: Mathematik, Medizin, Naturwissenschaften, Physik, Technik
Rubrik: Naturwissenschaften & Technik
Medium: Taschenbuch
Reihe: Topics in Applied Physics
Inhalt: xv
415 S.
66 s/w Illustr.
415 p. 66 illus.
ISBN-13: 9783662311042
ISBN-10: 3662311046
Sprache: Englisch
Ausstattung / Beilage: Paperback
Einband: Kartoniert / Broschiert
Autor: Behrisch, Rainer
Wittmaack, Klaus
Behrisch, R.
Hauffe, W.
Hofer, W. O.
Laegreid, N.
McClanahan, E. D.
Sundqvist, B. U. R.
Wittmaack, K.
Yu, M. L.
Redaktion: Wittmaack, Klaus
Behrisch, Rainer
Herausgeber: Rainer Behrisch/Klaus Wittmaack
Auflage: Softcover reprint of the original 1st ed. 1991
Hersteller: Springer-Verlag GmbH
Springer Berlin Heidelberg
Topics in Applied Physics
Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, D-69121 Heidelberg, juergen.hartmann@springer.com
Maße: 235 x 155 x 24 mm
Von/Mit: Klaus Wittmaack (u. a.)
Erscheinungsdatum: 23.08.2014
Gewicht: 0,657 kg
Artikel-ID: 105087973
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